thin film deposition lpcvd oxidation furnace

{"cid":"91184473","title":"6inch 8inch 12inch LPCVD Oxidation Furnace For Uniform Thin-Film Deposition","imgUrl":"https:\/\/img.ismap.com\/nimg\/f5\/57\/468b5fea560b58a56a16678938cb-200x200-1.jpg","attrs":{"Price":"by case","Brand Name":"ZMSH","Model Number":"LPCVD Oxidation Furnace","Minimum Order Quantity":"2","Delivery Time":"5-10months","Certification":"rohs","Place of Origin":"CHINA","Payment Terms":"T\/T","Wafer size:":"6\/8\/12 inch wafer","Compatible Materials:":"Polycrystalline silicon, silicon nitride, silicon oxide","Oxidation:":"Dry oxygen\/Wet oxygen (DCE, HCL)","Process temperature range:":"500\u00b0C-900\u00b0C","Temperature control accuracy:":"\u00b11\u00b0C","Application:":"Power semiconductors, Substrate materials"}}

{"cid":"91191224","title":"8\/6\/4\/2Inch LPCVD Oxidation Furnace Full Automation Low Oxygen Control Thin Film Deposition","imgUrl":"https:\/\/img.ismap.com\/nimg\/54\/59\/6035e092ddd4fe2ee5d9b0b1268e-200x200-1.jpg","attrs":{"Brand Name":"ZMSH","Minimum Order Quantity":"1","Place of Origin":"China","Payment Terms":"T\/T","Wafer Size":"8 inch 6 inch 4inch 2inch","Furnace Structure":"Vertical type","Batch Capacity":"150 wafers per batch","Film Uniformity":"Typically better than \u00b13%","Interface Standards":"SECS-II \/ HSMS \/ GEM","Supported Processes":"Dry & wet oxidation, N\u2082\/H\u2082 annealing, RTA, alloying"}}