6 inch semiconductor fast annealing furnace

{"cid":"91184473","title":"Automatic Double Cavity Semiconductor Fast Annealing Furnace Compatible With 6inch 8inch 12inch Wafer Heat Treatment Equipment 200-1300\u2103","imgUrl":"https:\/\/img.ismap.com\/nimg\/13\/50\/aa228a7ad10e319ef886a1554c74-200x200-1.jpg","attrs":{"Price":"by case","Brand Name":"ZMSH","Model Number":"Automatic double cavity fast annealing furnace","Minimum Order Quantity":"1","Certification":"rohs","Place of Origin":"CHINA","Payment Terms":"T\/T","Temperature range:":"1300\u2103","Heating rate:":"Up to 100\u00b0C\/ s","Degree of automation:":"Fully automatic control system","Application:":"SIC,GaN and other third generation semiconductor field"}}

{"cid":"91191224","title":"8\/6\/4\/2Inch LPCVD Oxidation Furnace Full Automation Low Oxygen Control Thin Film Deposition","imgUrl":"https:\/\/img.ismap.com\/nimg\/54\/59\/6035e092ddd4fe2ee5d9b0b1268e-200x200-1.jpg","attrs":{"Brand Name":"ZMSH","Minimum Order Quantity":"1","Place of Origin":"China","Payment Terms":"T\/T","Wafer Size":"8 inch 6 inch 4inch 2inch","Furnace Structure":"Vertical type","Batch Capacity":"150 wafers per batch","Film Uniformity":"Typically better than \u00b13%","Interface Standards":"SECS-II \/ HSMS \/ GEM","Supported Processes":"Dry & wet oxidation, N\u2082\/H\u2082 annealing, RTA, alloying"}}