Payment Terms | T/T |
Supply Ability | By case |
Delivery Time | 2-4 weeks |
Packaging Details | custom cartons |
Thermal conductivity | High (uniform field) |
High-temp strength/creep | Excellent |
Thermal shock | Excellent |
Max continuous use temperature | 1250 °C |
CVD SiC coating/surface impurities | < 5 ppm |
Inner-wall roughness | Ra ≤ 0.8–1.6 µm (fine polish / near-mirror optional) |
Brand Name | ZMSH |
Place of Origin | China |
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Product Specification
Payment Terms | T/T | Supply Ability | By case |
Delivery Time | 2-4 weeks | Packaging Details | custom cartons |
Thermal conductivity | High (uniform field) | High-temp strength/creep | Excellent |
Thermal shock | Excellent | Max continuous use temperature | 1250 °C |
CVD SiC coating/surface impurities | < 5 ppm | Inner-wall roughness | Ra ≤ 0.8–1.6 µm (fine polish / near-mirror optional) |
Brand Name | ZMSH | Place of Origin | China |
The Silicon Carbide (SiC) Horizontal Process Tube is the primary pressure boundary and clean process chamber used in high-temperature gas-phase reactions and heat treatment for semiconductor, photovoltaic, and advanced materials manufacturing.
The product adopts a 3D-printed monolithic SiC body + CVD SiC functional coating architecture, combining high thermal conductivity, low contamination, high mechanical strength, and chemical durability. It is optimized for processes that demand low particle/gas contamination, excellent temperature uniformity, and long-term stability.
Core value:
Push the tool’s temperature uniformity, cleanliness, and OEE to a higher level.
Extend replacement intervals and shorten cleaning downtime to optimize Total Cost of Ownership (TCO).
Provide a long-life, low-risk chamber solution for oxidative and chlorine-bearing chemistries at elevated temperature.
Working atmospheres
Reactive gases: oxygen (O₂) and other oxidizing mixtures
Carrier/protective gases: nitrogen (N₂) and high-purity inert gases
Compatible species: trace chlorine-bearing gases (concentration and residence time controlled by recipe)
Typical processes: dry/wet oxidation, anneal, diffusion, LPCVD/CVD deposition, surface activation/modification, PV passivation, functional thin-film formation, carbonization/nitridation, etc.
Temperature range: ambient to 1250 °C (recommend 10–15% safety margin depending on heater design and ΔT constraints)
Pressure range: from slight vacuum/LPCVD negative pressure to near-atmospheric positive pressure (final rating per PO/spec).
Monolithic SiC body (additive manufactured)
High-density β-SiC or multi-phase SiC; single-piece construction eliminates seams and braze joints that can create micro-leaks or stress concentrators.
High thermal conductivity (vs. alumina/quartz) supports rapid thermal response and improved axial/radial uniformity.
Low, stable CTE yields better high-temperature dimensional stability and seal integrity.
CVD SiC functional coating
In-situ deposited, dense and ultra-pure (surface/coating impurities < 5 ppm); minimizes particle shedding and metal ion release.
Outstanding chemical inertness toward oxidizing and chlorine-bearing gases; mitigates wall attack and re-deposition.
Zonal thickness tailoring available to balance corrosion resistance with thermal response.
Composite benefits
Body provides mechanical support + heat conduction; coating provides corrosion resistance + cleanliness—a system-level optimum for reliability and throughput.
Max continuous use temperature: 1250 °C
Substrate (bulk body) total impurities: < 300 ppm
CVD SiC coating/surface impurities: < 5 ppm
Dimensional tolerances (typical): OD ±0.3–0.5 mm; coaxiality ≤ 0.3 mm/m (tighter upon request)
Inner-wall roughness: Ra ≤ 0.8–1.6 µm (fine polish / near-mirror optional)
Leak tightness (helium): ≤ 1×10⁻⁹ Pa·m³/s (per tool class)
Thermal shock stability: supports repeated hot-cold cycling with no visible cracking or spallation (type-test report supplied)
Cleanliness: final clean/assembly in ISO Class 5–6 environment; particle and metal ion residues certified per customer spec.
Geometry: OD 50–400 mm (larger on evaluation), long-length one-piece bodies; wall thickness optimized for strength/weight/heat flux.
Ends & interfaces: flanges, bell-mouth, bayonet, locating rings, O-ring grooves, pump-out/pressure ports—tailored to your frames/jigs.
Functional ports: thermocouple feedthrough preparation, sight window seats, bypass gas inlets (all with high-temp, leak-tight design).
Coating strategies: inner wall (default), outer wall, or full coverage; local shielding/graded thickness for high-impingement zones.
Surface & cleanliness: roughness grade, ultrasonic/DI clean, drying/bake curves configurable.
Ancillaries: graphite/ceramic/metal flanges, seals, locating fixtures, handling sleeves and storage cradles.
Metric | SiC Tube | Quartz Tube | Alumina Tube | Graphite Tube |
---|---|---|---|---|
Thermal conductivity | High (uniform field) | Low | Low | High |
High-temp strength/creep | Excellent | Fair | Good | Good (oxidation-sensitive) |
Thermal shock | Excellent | Weak | Moderate | Excellent |
Cleanliness / metal ions | Excellent (low) | Moderate | Moderate | Poor |
Oxidation & Cl-chemistry | Excellent | Fair | Good | Poor (oxidizes) |
Cost vs. service life | Medium / long life | Low / short | Medium / medium | Medium / env-limited |
Q1. Why monolithic 3D-printed SiC?
A. Eliminates seams/brazes that cause leaks and stress peaks; enables complex geometries with repeatable dimensions.
Q2. Will Cl-bearing gases attack SiC?
A. CVD SiC is highly inert to most Cl species within specified temperature/partial pressure/residence limits. Use local thickening in high-impingement zones and ensure robust purge/exhaust design.
Q3. What are the practical gains vs. quartz?
A. Longer life, better uniformity, lower particles/metal ions, and better TCO—especially above ~900 °C and in oxidizing/Cl environments.
Q4. Is fast ramping supported?
A. Yes, with controlled max ΔT and rates; pair high-κ body + thin coating, and follow first-use bake SOP.
Q5. When should a tube be retired?
A. Trigger on any of: flange/edge cracks, coating pits/spall, rising leak rate, drifted temperature profile, abnormal particle events.
Company Details
Business Type:
Manufacturer,Agent,Importer,Exporter,Trading Company
Year Established:
2013
Total Annual:
1000000-1500000
Ecer Certification:
Verified Supplier
SHANGHAI FAMOUS TRADE CO.,LTD. locates in the city of Shanghai, Which is the best city of China, and our factory is founded in Wuxi city in 2014. We specialize in processing a varity of materials into wafers, substrates and custiomized optical glass parts.components widely used in electronics, op... SHANGHAI FAMOUS TRADE CO.,LTD. locates in the city of Shanghai, Which is the best city of China, and our factory is founded in Wuxi city in 2014. We specialize in processing a varity of materials into wafers, substrates and custiomized optical glass parts.components widely used in electronics, op...
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