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China factory - Shenzhen APG Material Company Limited

Shenzhen APG Material Company Limited

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China High Purity Graphite Sputtering Target Hot Pressing Sintering Process
China High Purity Graphite Sputtering Target Hot Pressing Sintering Process

  1. China High Purity Graphite Sputtering Target Hot Pressing Sintering Process
  2. China High Purity Graphite Sputtering Target Hot Pressing Sintering Process

High Purity Graphite Sputtering Target Hot Pressing Sintering Process

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Packaging Details Vacuum-sealed packaging, case-packed for storage and transport
Delivery Time 4-5 weeks
Payment Terms T/T
Supply Ability Stable supply
Purity 99.99%
Relative density ≥99%
Name Graphite Target (C)
Forming Process Hot Pressing Sintering
Product Specifications Flat Targets, Rotary Targets
Application Fields Semiconductor Manufacturing, Optical Device Component Manufacturing, Photovoltaic Industry,Aerospace
Brand Name APG
Place of Origin china
Certification ISO9001、ISO14001、ISO45001、IAFT16949

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  1. Product Details
  2. Company Details

Product Specification

Packaging Details Vacuum-sealed packaging, case-packed for storage and transport Delivery Time 4-5 weeks
Payment Terms T/T Supply Ability Stable supply
Purity 99.99% Relative density ≥99%
Name Graphite Target (C) Forming Process Hot Pressing Sintering
Product Specifications Flat Targets, Rotary Targets Application Fields Semiconductor Manufacturing, Optical Device Component Manufacturing, Photovoltaic Industry,Aerospace
Brand Name APG Place of Origin china
Certification ISO9001、ISO14001、ISO45001、IAFT16949
High Light High Purity Graphite Sputtering Target ,IAFT16949 Graphite Sputtering Target

Engineered from high-purity graphite, the graphite targets exhibit exceptional thermal stability, superior heat resistance, and a low coefficient of thermal expansion. These targets are critical for depositing high-performance carbon films in sectors such as semiconductors, photovoltaics, and advanced battery materials, where maintaining material integrity during high-temperature processing is paramount.

Outstanding Features of Graphite Target

 

l High Thermal Stability

 

It maintains stable performance in high-power, high-temperature sputtering processes, ensuring uniform film deposition.

 

 

l Low Thermal Expansion Coefficient

 

It is dimensionally stable under temperature changes, reducing deposition stress and enhancing the film's density and adhesion.

 

 

l Excellent Electrical Conductivity


Graphite targets have good electrical conductivity, making them suitable for the preparation of electronic devices, functional films, and conductive layers.

 

Wide Applications of Graphite Target

 

l Semiconductor Manufacturing


Graphite targets are used for preparing conductive films, carbon barrier layers, and interconnect layers, ensuring high performance and stability of devices.

 

 

l Optical Component Manufacturing


Used for preparing carbon films, anti-reflection coatings, and infrared absorption films, widely applied in optical components, laser devices, and infrared windows.

 

 

l Photovoltaic Industry


Used in photovoltaic cell back electrodes, fuel cell carbon layers, and supercapacitor conductive layers, enhancing energy conversion efficiency and device lifespan.

 

 

l Aerospace


Films deposited by graphite targets can serve as high-temperature protective coatings, improving heat resistance and wear resistance.

 

 

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Sputtering Targets for PVD Thin-Film Deposition APG manufactures metal, alloy, ceramic and rare earth sputtering targets for industrial PVD applications. Explore materials for semiconductor, photovoltaic, optical coating, display and Low-E glass applications. Browse sputtering target materials, meta... Sputtering Targets for PVD Thin-Film Deposition APG manufactures metal, alloy, ceramic and rare earth sputtering targets for industrial PVD applications. Explore materials for semiconductor, photovoltaic, optical coating, display and Low-E glass applications. Browse sputtering target materials, meta...

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  • Shenzhen APG Material Company Limited
  • HQ Add:Rooms 1401,Bldg.2,Runzhi R&D Center,CRB Tech-Innovative City, Xinan Street,Bao'an District,Shenzhen,China
  • https://www.apgsputtertarget.com/

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